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CNS Imaging and Analysis Facility

Location: Center for Nanoscale Systems, Harvard University, 11 Oxford Street, LISE Building, Cambridge, MA 02138

Summary:

Center for Nanoscale Systems facility dealing with "SEM, TEM, ESEM, sample prep etc."

Affiliations:

People:

    Resources:

    Instruments

    • Allied TechPrep polisher ( Polisher )

      "The Allied Tech Prep enables precise semi-automatic/ Manual sample thinning and polishing of a wide range of materials for optical, SEM, FIB, TEM, AFM, evaluation. Capabilities include parallel polishing, angle polishing, site-specific polishing."

    • Balzers BAF 400T freeze etch system ( Vacuum coating system )

      "High vacuum coating system under cryo or ambient conditions. Replicas of unfixed viscous or liquid samples are flash frozen and freeze 'cracked' or microtomed in system followed by coating of platinum and carbon to create a permanent replica for TEM or SEM imaging."

    • Cressington 208HR Sputter Coater ( Sputter coater )

    • Cs-STEM Aberration Corrected Zeiss Libra 200 MC ( Scanning transmission electron microscope )

      "Analytical, Scanning Transmission Electron Microscope (STEM) with Cs- aberration corrected optics, monochromated source, in-column omega energy filter and twin EDS detectors. Pre and Post filter ADF detectors. Resolution 0.1 nm, with energy resolution of 87meV. Optimized for nano-analytical capability."

    • Cs-TEM Aberration Corrected MC Zeiss 200-80 ( Energy filtering transmission electron microscope )

      "Aberration Corrected Transmission Electron Microscope (TEM) with monochromator and in-column energy filter. Sub-angstrom resolution, meV energy spread."

    • DiATOME Diamond Knife and Controller ( Diamond knife )

      Used for materials preparation.

    • Diener/Femto plasma cleaner ( Plasma cleaner )

      Used for imaging sample prep.

    • FEI Cryogenic-Biological Transmission Electron Microscope ( Transmission electron microscope )

      "Dedicated Cryogenic-Biological TEM. The 200kV microscope combines high resolution performance, high-tilt capability, specimen protection at liquid nitrogen temperature with a cryo transfer system."

    • Fischione 1010 Ion Mill ( Milling machine )

      "The Model 1010 Ion Mill is a tabletop, PC-controlled precision milling and polishing system for creating high-quality TEM specimens with large electron
      transparent areas."

    • Fischione 1040 Nano Mill ( Milling machine )

      "Ultra-low-energy, concentrated ion beam is ideal for preparing today's specimens of advanced materials for TEM imaging and analysis."

    • Fischione 110 electrochemical jet polisher ( Fluid jet polisher )

      Used for image sample prep.

    • Fischione 110 plasma cleaner ( Plasma cleaner )

      "The Fischione 110 is used for TEM sample cleaning. The systems oil free dry pumping combined with low energy plasma makes this an ideal tool for clean TEM samples and TEM sample rods. This tool accommodates both the JEOL TEM sample rods and the ZEISS STEM sample rods."

    • Fischione 170 ultrasonic cutter ( Ultrasonic cutter )

    • Fischione 200 Dimpler ( Dimpler )

    • Gatan 601 ultrasonic cutter ( Ultrasonic cutter )

      Used for imaging sample prep.

    • Gatan 655 dry pumping station ( Dry pumping station )

      Used for imaging sample prep.

    • Gatan CP3 Cryoplunge ( Plunge freezing instrument )

      "The Gatan Cryoplunge Cp3 is a semi-automated plunge freezing instrument used for the preparation of frozen hydrated specimens for cryo transmission electron microscopy (cryoEM). Cp3 incorporates a humidity chamber and timed single or multiple blot capabilities for 1-sided or 2-sided blotting."

    • Gatan Duomill ( Milling machine )

      "The GATAN model Duo mill 600 DIF (CYRO Capable) is used for the last step in the preparation of samples for transmission electron microscopy. The sample is thinned from both sides by means of a beam of ionized argon gas."

    • JEOL 2010 FEG - TEM/STEM ( Transmission electron microscope )

      "The JEOL TEM/STEM is a transmission electron microscope for imaging solid materials that can perform high resolution lattice imaging in TEM mode or annular-dark field (DF) lattice imaging in STEM (scanning) mode. Bright Field (BF) and Dark Field (DF) imaging are performed in both TEM and STEM modes, phase contrast imaging, Energy Dispersive X-ray Spectroscopy (EDS) in both point & chemistry mapping modes. Atomic arrangements are determined by electron diffraction in Selected Area, CBED (convergent beam), and nanodiffraction modes.

      Imaging/Analysis:

      * Lattice resolution is 0.19nm pt-to-pt in TEM mode and STEM probe resolution is 0.2nm. Beam energy to 200kV.
      * Vacuum requirements: sample at <1x10-5 Pascal.
      * X-tilt +/-30°, Y-tilt +/-12° (depending on holder)
      * X/Y motion +/-1mm, Z motion +/-0.2mm
      * 3 CCD cameras capturing magnifications 50x to 50Mx.
      * EDS x-ray detector, Be and higher Z, 0.1% sensitivity, mapping.

      In situ Experiments:

      * Vacuum requirements: sample at <1x10-5 Pascal.
      * Heating (double tilt) holder: to 1000C<500C without water cooling
      * Cryo holder: -180C to 200C, cryo-transfer
      * AFM tip holder"

    • JEOL 2100 TEM ( Transmission electron microscope )

      "The JEOL 2100 TEM is our general purpose, entry level Lab6 source TEM. Users have the option to use from 80 kV to 200 kV. The system uses a Gatan Osiris 2k x 2k digital camera capable of taking high resolution images."

    • JEOL Cross Section Polisher ( Polisher )

      "The JEOL Cross section polisher uses Ar Ion milling to polish cross sections for SEM observation."

    • LEAP 4000X HR 3D atom probe ( Atom probe )

      "The system uses a UV laser with a tightly focused spot. The small UV laser spot enables exceptional mass resolution to be obtained. The use of UV wavelength enables a wide variety of materials, including many insulators, to be analyzed with good yield. High specimen throughput is obtained by achieving fast pulse repetition rates. For laser pulsing applications, the LEAP 4000X HR also provides excellent mass resolving power at full Field from the tightly focused UV laser spot and long ion flight times.

      The LEAP 4000X HRTM is a high performance 3D am probe microscope which provides nano-scale surface, bulk and interfacial materials analysis of simple and complex structures with atom by atom identification and accurate spatial positioning."

    • Leica KMR2 microtome knifemaker ( Microtome knife maker )

      "The Leica EM KMR2 glass knife maker can be used to make high quality glass knives for face blocks and preparing sections. This knife maker uses the balanced method for generating knives from a strip for glass."

    • Leica MED-020 Baltec sputter coater ( Sputter coater )

      "carbon coater w/various attachments can also be used to coat metals, used to coat TEM and SEM samples."

    • Leica Ultracut UCT ( Ultratome )

      "The CNS houses a Leica Ultracut UCT with optional cryo attachement. This ultramicrotome is routinely used to prepare sections for 50 nm to 1 micron in thickness from samples (material or biological) embedded in an appropriate resin. With the cryo attachment installed, the temperature of the knife, sample and chamber can be controlled independently. The cryo-attachment will allow the biologist to section hydrated materials, typically used for immuno-labeling sections mounted on grids."

    • Libra 120 TEM ( Transmission electron microscope )

      "The Zeiss Libra 120 Energy Filtered Transmission Electron Microscope with full-time Omega filtering system is exceptionally well suited for biological and light element material samples. Pre aligned settings at multiple acceleration voltages allow the user to easily switch between 60, 80, 100 and 120 KeV, without beam instability. In addition to standard Bright field imaging and electron diffraction imaging, the Libra 120 also offers electron spectroscopic imaging (ESI), electron spectroscopic diffraction (ESD), electron energy loss spectroscopy (EELS), and Contrast Tuning."

    • Nikon Eclipse ME600L optical microscope ( Digital microscope )

      "With DXM1200 camera and Dell PC."

    • Nikon SMZ1000 optical stereo microscope ( Inverted stereo microscope )

      Microscope, optical, stereo zoom.

    • Nikon SMZ645 optical stereo microscope ( Inverted stereo microscope )

      Microscope, optical, stereo zoom. Facility has 4 of these microscopes.

    • Testbourne 650 Low-speed diamond saw ( Precision trim saw )

      Used for imaging sample prep.

    • Tousimis Auto Samdri 815 Series A Critical Point Dryer ( Critical point dryer )

      "Automated CPD for dehydrated biological material or other samples."

    • Zeiss EVO Environmental Scanning Electron Microscope ( Environmental scanning electron microscope )

      "EVO 55 provides quality results from a versatile analytical microscope with a large specimen chamber. Specimen can be imaged or analyzing at High Vacuum or in environmental mode capture techniques provide the most informative images. XVP operation mode even provides for the introduction of water vapor to prevent dehydration damage for biological and semi-hydrated samples."

    • Zeiss Supra55VP Field Emission Scanning Electron Microscope ( Field emission scanning electron microscope )

      "The Supra55VP Field Emission Scanning Electron Microscope (FESEM) allows surface examination down to nanometer scales in either high vacuum or in Variable Pressure (VP) mode. The SEM uses a low to moderate energy (0.1 to 30 keV) electron beam to image a sample with resolutions down to 1 nm at 15 keV in high vacuum or 2 nm at 30 keV in VP mode. The Supra55VP has an Energy Dispersive x-ray Spectrometer (EDS) for elemental analysis (B-U) and mapping. The Supra55VP also has an Electron BackScattered Diffraction (EBSD) system for phase identification, crystal orientation and phase mapping using Kikuchi patterns."

    • Zeiss Ultra Plus Field Emission Scanning Electron Microscope ( Field emission scanning electron microscope )

      "The Ultra Plus Field Emission Scanning Electron Microscope (FESEM) allows surface examination down to nanometer scales. The FESEM uses a low to moderate energy (0.1 to 30 keV) electron beam to image the surface of a sample in high vacuum with edge resolutions down to 1 nanometer at 15 keV and 1.7 nm at 1 keV."

    • Zeiss Ultra55 Field Emission Scanning Electron Microscope ( Field emission scanning electron microscope )

      "The Ultra55 Field Emission Scanning Electron Microscope (FESEM) allows surface examination down to nanometer scales. The SEM uses a low to moderate energy (0.1 to 30 keV) electron beam to image a sample in high vacuum with resolutions down to 1 nanometer at 15 keV and 1.7 nm at 1 keV."

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    Last updated: 2015-01-16T13:37:46.812-06:00

    Copyright © 2016 by the President and Fellows of Harvard College
    The eagle-i Consortium is supported by NIH Grant #5U24RR029825-02 / Copyright 2016