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Heidelberg DWL-66 Mask Writer

eagle-i ID

http://harvard.eagle-i.net/i/00000130-dcdb-0f32-6a45-990480000000

Resource Type

  1. Maskless lithography system

Properties

  1. Resource Description
    "The Heidelberg DWL 66 is a high resolution, laser-based maskless optical lithography system, used at CNS for writing photomasks. The tool also has the capability to write directly on substrates such as silicon and quartz wafers." 2-40 mm write heads, backside alignment tool, high resolution interferometer.
  2. Additional Name
    MW-1
  3. Manufacturer
    Heidelberg Instruments
  4. Model Number
    DWL-66
  5. ERO_0000067
    2002
  6. Website(s)
    http://www.cns.fas.harvard.edu/facilities/tool.php?MID=29
  7. Website(s)
    http://www.himt.de/en/products/dwl66fs.php
  8. Location
    CNS Nanofabrication Facility
 
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Provenance Metadata About This Resource Record

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