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Heidelberg DWL-66 Mask Writer
eagle-i ID
http://harvard.eagle-i.net/i/00000130-dcdb-0f32-6a45-990480000000
Resource Type
Properties
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Resource Description
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"The Heidelberg DWL 66 is a high resolution, laser-based maskless optical lithography system, used at CNS for writing photomasks. The tool also has the capability to write directly on substrates such as silicon and quartz wafers."
2-40 mm write heads, backside alignment tool, high resolution interferometer.
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Additional Name
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MW-1
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Manufacturer
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Heidelberg Instruments
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Model Number
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DWL-66
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ERO_0000067
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2002
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Website(s)
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http://www.cns.fas.harvard.edu/facilities/tool.php?MID=29
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Website(s)
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http://www.himt.de/en/products/dwl66fs.php
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Location
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CNS Nanofabrication Facility
