Heidelberg DWL-66 Mask Writer

eagle-i ID

Resource Type

Properties

1. Resource Description

   "The Heidelberg DWL 66 is a high resolution, laser-based maskless optical lithography system, used at CNS for writing photomasks. The tool also has the capability to write directly on substrates such as silicon and quartz wafers." 2-40 mm write heads, backside alignment tool, high resolution interferometer.

2. Additional Name

   MW-1

3. Manufacturer

   Heidelberg Instruments

4. Model Number

   DWL-66

5. ERO_0000067

   2002

6. Website(s)

   http://www.cns.fas.harvard.edu/facilities/tool.php?MID=29

7. Website(s)

   http://www.himt.de/en/products/dwl66fs.php

8. Location

   CNS Nanofabrication Facility